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China Material Technology Co., Ltd.
China Material Technology Co., Ltd.  

Gold Index: 1692

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Company Info

China Material Technology Co., Ltd. [China (Mainland)]


Business Type:Manufacturer
City: Nanchang
Province/State: Jiangxi
Country/Region: China (Mainland)

China metal target manufacturer & supplier

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  • sputtering target Zinc oxide doped antimony oxide 99.99% for coating

sputtering target Zinc oxide doped antimony oxide 99.99% for coating new

ATO

ATO(Sb2O3+SnO2) target 99.99%

2014-07-19

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  • The RF SiC silicon carbide sputtering target

The RF SiC silicon carbide sputtering target new

Grade:SiC
Application:Industrial grade coating
Content(percent):99.5%
Brand Name:MAT-CN
Model Number:SiC target...

2014-05-23

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  • high purity AlN sputtering target

high purity AlN sputtering target new

Application:Industrial grade coating
Content(percent):99.99%
Brand Name:MAT-CN
Model Number:AlN target
Composition:AlN

2014-05-12

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  • AZO target-Zinc oxide doped alumina target-sputtering target

AZO target-Zinc oxide doped alumina target-sputtering target new

AZO

Brand Name:Mat-cn
Model Number:AZO-T
Density:Hi-density
Error:Min-error
Purity:99.99% Min (Up to 99.999% available)...

2014-05-12

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  • high purity CeO2 sputtering target

high purity CeO2 sputtering target new

CeO2/TREO99.99%;TREO99.97%
Physical properties
Color Yellow
Density 7.3g/ml

2014-05-12

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  • Flat CuNiIn-Copper-nickel indium-sputtering target

Flat CuNiIn-Copper-nickel indium-sputtering target new

CuNiIn target Copper-nickel indium target (MAT-CN)
Physical properties
Color silver
Density -g/m³
Melting point -...

2014-05-12

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  • titanium target circle plate

titanium target circle plate new

Brand Name: Mat-cn
Model Number: Ti-T
Density: Hi-density
Error: Min-error
Purity:99.99% Min (Up to 99.999% available)

2014-05-12

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  • Gold target circle plate

Gold target circle plate new

Composition:AU
Shapes:Discs, Plates, Sheets, Foils, Custom-made
Error:Min-error
Density:Hi-density
Binding:Support...

2014-05-12

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  • sputtering target Cu target

sputtering target Cu target new

Content(percent):99.99%
Brand Name:MAT-CN
Model Number:Cu-T
Product Type:Metal
Composition:Cu...

2014-05-12

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  • sputtering target Mg target

sputtering target Mg target new

Product Type:Metal
Composition:Mg
Size:support any size
Error:Min-error
Density:Hi-density...

2014-05-12

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  • sputtering target Al metal

sputtering target Al metal new

Grade:aluminium
Application:sputtering target
Content(percent):99.999%
Brand Name:MAT-CN
Model Number:Al-T...

2014-06-13

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